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光學(xué)材料的表征 版權(quán)信息
- ISBN:9787560342795
- 條形碼:9787560342795 ; 978-7-5603-4279-5
- 裝幀:一般膠版紙
- 冊(cè)數(shù):暫無(wú)
- 重量:暫無(wú)
- 所屬分類:>>
光學(xué)材料的表征 本書特色
光學(xué)材料表征一書提供了關(guān)于在不同表征技術(shù)影響下理解光學(xué)材料的性能與特性方面的知識(shí)。表面與界面性質(zhì)對(duì)材料的光響應(yīng)是非常重要的,為實(shí)現(xiàn)所需性能在材料加工過程中對(duì)他們進(jìn)行控制與修飾是必要的。《光學(xué)材料的表征》(作者布倫德爾、埃文斯、伊莎霍斯)一書集中介紹了表面形貌、微觀結(jié)構(gòu)及化學(xué)鍵是如何影響材料的光響應(yīng),它介紹了用于表征薄膜、多層結(jié)構(gòu)與改性表面的方法。
光學(xué)材料的表征 內(nèi)容簡(jiǎn)介
characterization in optica/ materia/s provides information for understanding the properties and performance of optical materials under the influence of the various characterization techniques. surface and interfacial properties are key to the optical response of a material, and their control and modification during materials processing is necessary to achieve desired behavior. characterization of optica/ materia/s focuses on how surface morphology, microstructure, and chemical bonding influence the optical response of a material, and it illuminates methods used to characterize thin films, multilayer structures, and modified surfaces,
光學(xué)材料的表征 目錄
preface to series
preface to the reissue of characterization of optical materials
preface
contributors
introduction
part 1 influence of surfacemorphologyand
microstructure on optical response
characterization of surface roughness
1.1 introduction
1.2 whatsurfaceroughnessls
1.3 howsurfaceroughness affctsopticaimeasurements
1.4 how surface roughness and scatteringare measured
1.5 characterization ofselected surfaces
1.6 future difections
characterization of the near-surface region using poiarization-sensitive optical techniques
2.1 introduction
2.2 ellipsometry
experimentallmplementationsofellipsometry 29, analysisof
ellipsometrydata
2.3 microstructuraldeterminationsfromellipsometrydata
temperature dependence ofthe opticat properties ofsilicon 34,
determination ofthe optical functions ofglasses using se 35,
spectroscopicellipsometrystudiesofsi02/si 37, spectroscopic
ellipsometryforcomplicatedfilmstrucrures 38, time-resolved
ellipsometry 40, single-wavelengthreal-timemonitoringoffilm
growth 41, multiple-wavelengthreal-timemonitoringoffilm
growth 42, infrared ellipsometrystudies offilm growth
the composition, stoichiometry, and related microstructure of optical materials
3.1 introduction
3.2 aspectsoframanscattering
3.3 iii-vsemiconductor systems
3.4 groupivmaterials
3.5 amorphous and microcrystalline semiconductors
chalcogenideglasses 60, groupivmicrocrystallinesemiconductors
3.6 summary
diamond as an optical material
4.1 introduction
4.2 depositionmethods
4.3 0pticalpropertiesofcvd diamond
4.4 defectsin cvd diamond
4.5 polishingcvd diamond
4.6 x-raywindow
4.7 summary
part 2 stability and modification of film and surface optical properties
multijayer optical coatings
5.1 introduction
5.2 single-layeropticalcoatings
opticaiconstants 90, compositionmeasurementtechniques
5.3 multilayeropticalcoatings
compositionaianalysis 107, surfaceanalyticaitechniques 108,
microstructuralanalysis ofmultilayer optical coatings
5.4 stabilityofmultilayeropticalcoatings
5.5 future compositional and
microstructuralanalyticaitechniques
characterization and control of stress in optical films
6.1 introduction
6.2 0rigins ofstress
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